Handbook of plasma processing technology fundamentals, etching, deposition, and surface interactions
by
Rossnagel, Stephen M.
Title
:
Handbook of plasma processing technology fundamentals, etching, deposition, and surface interactions
Author
:
Rossnagel, Stephen M.
ISBN
:
9781591242970
9780815512202
Publication Information
:
Park Ridge, N.J. : Noyes Publications, ©1990.
Physical Description
:
1 online resource (xxiii, 523 pages) : illustrations.
Series
:
Materials science and process technology series
Materials science and process technology series.
Abstract
:
An overview of the technology that describes the advantages provided by plasmas, plasma fundamentals, and a range of plasma processes relevant to the deposition and etching of thin films for microelectronics and other fields.
Local Note
:
Knovel Library
Subject Term
:
Plasma engineering.
Semiconductors -- Etching.
Plasma etching.
Plasma engineering. (OCoLC)fst01066322
Plasma etching. (OCoLC)fst01066327
Semiconductors -- Etching. (OCoLC)fst01112219
Genre
:
Electronic books.
Added Author
:
Rossnagel, Stephen M.
Cuomo, J. J.
Westwood, William D. (William Dickson), 1937-
Electronic Access
:
| Library | Material Type | Item Barcode | Shelf Number | Status |
|---|
| IYTE Library | E-Book | 1170890-1001 | TA2020 .H37 1990 EB | Online Knovel |