U2O5 Film Preparation via UO2 Deposition by Direct Current Sputtering and Successive Oxidation and Reduction with Atomic Oxygen and Atomic Hydrogen
by
 
Gouder, Thomas

Title
: 
U2O5 Film Preparation via UO2 Deposition by Direct Current Sputtering and Successive Oxidation and Reduction with Atomic Oxygen and Atomic Hydrogen

Author
: 
Gouder, Thomas

Personal Author
: 
Gouder, Thomas

Publication Information
: 
Cambridge, MA MyJoVE Corp 2016

Physical Description
: 
online resource (725 seconds)

Series
: 
Chemistry

General Note
: 
Title from resource description page

Abstract
: 
This protocol presents the preparation of U2O5 thin films obtained in situ under ultra-high vacuum. The process involves oxidation and reduction of UO2 films with atomic oxygen and atomic hydrogen, respectively.

Reading Level
: 
For undergraduate, graduate, and professional students

Subject Term
: 
Chemistry

Electronic Access
: 
https://www.jove.com/t/59017


LibraryMaterial TypeItem BarcodeShelf NumberStatus
IYTE LibraryOnline Video2250156-1001XX(2250156.1)JoVe Video Online