TEXTURIZATION AND LIGHTTRAPPING IN SILICON SOLARCELLS -- TEXTURIZATION AND LIGHTTRAPPING IN SILICON SOLARCELLS -- CONTENTS -- PREFACE -- INTRODUCTION -- MODELS OF TEXTURIZATION -- 2.1. SILICON SOLAR CELL WITH MICRO-GROOVED FRONTSURFACE AND LAMBERTIAN (RANDOMLY TEXTURED) BACKSURFACE -- 2.1.1. Reflection Coefficient of Micro-Grooved Silicon FrontSurface -- 2.1.2. Reflection Coefficient of the Micro-Grooved Silicon Surfacewith AR Coating for Different Slat Angles -- 2.1.3. Cell Geometry, Light Trapping, Optical Path LengthEnhancement and Effective Absorption Co-Efficient -- 2.1.4.Effect of Texturization of Solar Cell Parameters -- 2.2. DIFFERENT STRUCTURES FOR REDUCTION OFREFLECTION CO-EFFICIENT AND OPTICAL TRAPPING -- Lambertian Geometry -- 2.2.1. Upright Pyramid Geometry -- 2.2.2. Slat or Micro-Grooved Geometry -- 2.2.3. Inverted Pyramids Geometry -- 2.2.4. Simple Prism Pyramid Geometry -- 2.2.5. Grating Geometry -- 2.2.6. Three Perpendicular Planes (3PP) Geometry -- 2.2.7. Perpendicular Slats Geometry -- 2.2.8. Porous Silicon -- 2.3. COMPARATIVE PERFORMANCE IN LIGHT TRAPPING FORSEVERAL GEOMETRIES -- TECHNOLOGY FOR REALIZINGTEXTURIZATION FOR MONOCRYSTALLINESILICON SOLAR CELL -- 3.1. STANDARD NAOH-IPA TEXTURIZATION APPROACH -- 3.2. NEW TEXTURIZATION APPROACH -- 3.2.1. Hydrazine Monohydrate -Isopropyl Texturization -- 3.2.2. Tri-Basic Sodium Phosphate -Isopropyl Texturization -- 3.2.3. Sodium Carbonate/Sodium Bicarbonate Texturization -- 3.3. COMPARISON OF DIFFERENT ELECTRICALPARAMETERS OF MONOCRYSTALLINE SILICON SOLAR CELLUSING CONVENTIONAL NAOH TEXTURIZATION WITH THOSEUSING RECENTLY DEVELOPED TEXTURIZATION PROCESS -- 3.3.1. Conventional Sodium hydroxide-Isopropyl and Hydrazine -Isopropyl Textured Monocrystalline Silicon Solar Cell.

3.3.2. Conventional Sodium Hydroxide-Isopropyl and Tri SodiumPhosphate-Isopropyl Textured Monocrystalline Silicon Solar Cell -- 3.4. INDUSTRIAL APPLICABILITY -- MULTICRYSTALLINE SILICON ETCHING FORSOLAR CELL FABRICATION -- 4.1. ALKALINE ETCHANTS FOR MC-SI SOLAR CELLPROCESSING -- 4.2. ISOTROPIC TEXTURING WITH HF-HNO3-H2O SOLUTIONFOR MC-SI SOLAR CELL PROCESSING -- 4.3. SODIUM HYDROXIDE - SODIUM HYPOCHLORITE (NAOH- NAOCL) SOLUTION FOR MC-SI SOLAR CELL PROCESSING -- 4.4. MECHANICAL TEXTURING FOR MC-SI SOLAR CELLPROCESSING -- 4.5. PLASMA ETCHING FOR MC-SI SOLAR CELLPROCESSING -- 4.5.1. Reactive Ion Etching(Rie) -- 4.5.2. Black Silicon Layer Formation by Rf Multi-Hollow CathodeSystem -- 4.6. MULTICRYSTALLINE SILICON SOLAR CELLPERFORMANCE -- 4.6.1. Multicrystalline Silicon Solar Cell Using Conventional NaOHTexturization -- 4.6.2. Comparison of Multicrystalline Silicon Solar CellPerformance Using Texturization with Naoh-Naocl and HighConcentration Naoh Solution -- 4.6.3. Multicrystalline Silicon Solar Cell Using RIE Texturization -- 4.7. INDUSTRIAL APPLICATION -- REFERENCES -- INDEX.