Cover image for Principles of physical vapor deposition of thin films
Principles of physical vapor deposition of thin films
Title:
Principles of physical vapor deposition of thin films
Author:
SreeHarsha, K. S.
ISBN:
9780080446998
Personal Author:
Edition:
1st ed.
Publication Information:
Amsterdam ; Boston ; London : Elsevier, 2006.
Physical Description:
xi, 1160 p. : ill. ; 25 cm.
Abstract:
The goal of producing devices that are smaller, faster, more functional, reproducible, reliable and economical has given thin film processing a unique role in technology. Principles of Vapor Deposition of Thin Films brings in to one place a diverse amount of scientific background that is considered essential to become knowledgeable in thin film depostition techniques. Its ultimate goal as a reference is to provide the foundation upon which thin film science and technological innovation are possible. * Offers detailed derivation of important formulae. * Thoroughly covers the basic principles of materials science that are important to any thin film preparation. * Careful attention to terminologies, concepts and definitions, as well as abundance of illustrations offer clear support for the text.
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