Plasma Polymer Films -- CONTENTS -- PREFACE -- CHAPTER 1 INTRODUCTION Hynek Biederman -- 1.1. History -- 1.2. What is a Plasma Polymer? -- 1.3. Deposition Systems for Plasma Polymerization -- 1.4. Deposition (Plasma) Process Parameters -- 1.5. Models of Plasma Polymerization -- 1.6. Types of Plasma Polymers and their Characterization -- 1.7. Conclusions -- References -- CHAPTER 2 PLASMA DEPOSITION OF FLUOROPOLYMER FILMS IN DIFFERENT GLOW DISCHARGE REGIMES Pietro Favia -- 2.1. Introduction -- 2.2. On the Jargon of PE-CVD Processes -- 2.3. Continuous, Afterglow and Modulated PE-CVD -- 2.3.1. Fluorocarbon Monomers -- 2.4. Diagnostic Techniques for PE-CVD Processes of Fluoropolymers -- 2.4.1. Surface and Bulk Analysis -- 2.4.2. Plasma Diagnostic Techniques -- 2.5. Active Species in Fluorocarbon Plasmas -- 2.5.1. Additives to Drive the F/CFx Density Ratio of a Fluorocarbon Discharge -- 2.6. Relevant Parameters in PE-CVD Processes of Fluoropolymers -- 2.6.1. Ion Bombardment and Substrate Temperature -- 2.6.2. Power, Flow Rate, Pressure and Combined Parameters -- 2.6.3. Distance of the Substrate from the Glow -- 2.6.4. Duty Cycle and Period in Modulated Plasmas -- 2.7. The Activated Growth Model -- 2.8. Applications of Plasma-Deposited Fluoropolymers -- 2.8.1. Wettability of Fluorocarbon Coatings and Applications for Textiles and Paper -- 2.8.2. Biomedical Applications Proposed for Plasma-Deposited Fluoropolymers -- 2.9. Conclusive Remarks -- Acknowledgements -- References -- CHAPTER 3 DEPOSITION OF SILICON CONTAINING FILMS AND FTIR DIAGNOSTICS Yvan Segui and Patrice Raynaud -- 3.1. Introduction -- 3.2. Precursors -- 3.3. Species Detected in Organosilicon Plasmas -- 3.3.1. Optical Emission Spectroscopy (OES) -- 3.3.2. Mass Spectroscopy -- 3.3.3. Infrared Absorbtion Spectroscopy of the Plasma -- 3.3.3.1. Principles of FTIR Diagnostic of the Plasma Phase.

3.3.3.2. The Absorption Spectra -- 3.3.3.3. Quantitative Analysis (Absorption Spectrometry) -- 3.3.3.4. Infrared Diagnostics of Organosilicon Plasma -- 3.4. Open Questions and Conclusions -- 3.4.1. Species in the Gas Phase -- 3.4.2. Interface Plasma-Surface -- Growing Mechanisms -- References -- CHAPTER 4 CORPUSCULAR DIAGNOSTICS OF PLASMA POLYMERIZATION PROCESSES Michael Zeuner -- 4.1. Corpuscular Diagnostics in Plasma Processing -- 4.2. Basic Processes in Particle Interaction -- 4.2.1. Gas Discharge Phenomena -- 4.2.2. Plasma Sheath Effects -- 4.2.3. Surface Interaction -- 4.3. Experimental Equipment for Corpuscular Diagnostics -- 4.3.1. Common Particle Collection by Film Deposition -- 4.3.2. Mass Spectrornetrical Methods -- 4.3.3. Energy Filter Techniques -- 4.4. Neutral Species Detection -- 4.4.1. Neutral Flux Detection and Partial Pressure Analysis -- 4.4.2. Threshold Ionization Mass Spectrometry -- 4.4.3. Electron Attachment Mass Spectrometry -- 4.5. Process Ion Detection -- 4.5.1. RF Plasma Processing -- 4.5.2. RF Sputter Deposition -- 4.5.3. Microwave Plasma Processing -- 4.5.4. Negative Ion Detection -- 4.5.5. Pulsed Plasma Operation -- 4.5.6. Plasma Ion Mass Spectra -- References -- CHAPTER 5 ELECTRICAL AND OPTICAL PROPERTIES OF PLASMA POLYMERS Jacek Tyczkowski -- 5.1. Introduction -- 5.2. Electronic Structure -- 5.2.1. Theoretical Models -- 5.2.2. Experimental Methods -- 5.2.2.1. Optical Spectra -- 5.2.2.2. Internal Photoemission -- 5.2.2.3. Photoelectron Spectroscopies -- 5.2.2.4. Electrical Transport Methods -- 5.3. Amorphous Semiconductors -- 5.3.1. Band Model -- 5.3.2. Doping -- 5.3.3. Alloying -- 5.3.4. Charge Carrier Transport -- 5.4. Amorphous insulators -- 5.4.1. Band Model -- 5.4.2. Electrical Conductivity -- 5.4.2.1. Charge Carriers -- 5.4.2.2. Generation Mechanisms -- 5.4.2.3. Transport Mechanisms.

5.5. Amorphous Insulator - Amorphous Semiconductor Transition -- 5.6. Electronic Properties and Potential Applications -- 5.6.1. Electrical Properties -- 5.6.1.1. Low Conducting Films -- 5.6.1.2. High Conducting Films -- 5.6.1.3. Intermediately Conducting Films -- 5.6.2. Optical and Optoelectronic Properties -- 5.6.2.1. Coatings and Films for Optical Devices -- 5.6.2.2. Integrated Optics -- 5.6.2.3. Optoelectronic Devices -- 5.6.3. Current Problems -- References -- CHAPTER 6 PULSED PLASMA POLYMERIZATIONS Richard B. Timmons and Andrew J. Griggs -- 6.1. Introduction -- 6.1.1. Controlling Film Chemistry during Plasma Polymerizations -- 6.1.2. The Pulsed Plasma Approach -- 6.2. Experimental Considerations -- 6.2.1. Power Input Considerations -- 6.2.2. Film Formation Rates -- 6.2.3. Mean Roughness of Polymer Films Deposited under Pulsed Operation -- 6.2.4. Film Adhesion and Film Stability -- 6.3. Results -- 6.3.1. Some Examples of Film Chemistry Control under Pulsed Plasma Conditions -- 6.3.2. Film Formation Rates -- 6.3.3. Polymerization under Ultra Low Power Input Conditions -- 6.3.4 Film Composition Obtained under Equivalent Power Input Conditions during Pulsed and CW Plasma Polymerizations -- 6.4. Applications -- 6.4.1. Biomaterials -- 6.4.2. Thin Layer Adhesives -- 6.4.3. Synthesis of Super Hydrophobic Surfaces -- 6.4.4. Low Dielectric Constant Films -- 6.4.5 Electrically Conductive Polymers -- 6.5. Discussion -- Acknowledgements -- References -- CHAPTER 7 DEGRADATION AND STABILITY OF PLASMA POLYMERS Andreas Hollander and Jorg Thome -- 7.1. Introduction -- 7.2. Mechanisms of Polymer Degradation -- 7.2.1. General Considerations -- 7.2.2. Thermal Degradation -- 7.2.2.1. Hydrocarbon Polymer -- 7.2.2.2. Oxygen Containing Polymers -- 7.2.2.3. Aromatic Structures -- 7.2.2.4. Fluoropolymers -- 7.2.2.5. Silicone Polymers -- 7.2.3. Oxidation.

7.2.4. Photooxidation -- 7.3. The Degradation of Plasma Polymers -- 7.3.1. Structural Characteristics of Plasma Polymers -- 7.3.1.1. General Considerations -- 7.3.1.2. Plasma Polymer Coatings -- 7.3.2. Aging of PIasma PoIymers in Air -- 7.3.2.1. Hydrocarbon Plasma Polymers -- 7.3.2.2. Oxygen Containing Plasma Polymers -- 7.3.2.3. Nitrogen Containing Plasma Polymers -- 7.3.2.4. Fluoroaromatic Plasma Polymers -- 7.3.2.5. Siloxane and Silazane Plasma Polymers -- 7.3.2.6. Thermal Degradation of Plasma Polymers -- 7.3.2.7. Photooxidation of Plasma Polymers -- 7.3.3. General Features of Plasma Polymer Degradation -- 7.4. Preparation of Stable Plasma Polymers -- 7.4.1. Reduction of the Radical Concentration -- 7.4.1.1. Copolymerization -- 7.4.1.2. Thermal Annealing -- 7.4.1.3. Quenching of Trapped Radicals -- 7.4.2. Design Rules for Stable Plasma Polymers -- 7.5. Conclusions -- References -- CHAPTER 8 APPLICATION OF ATMOSPHERIC PRESSURE DISCHARGE FOR PLASMA POLYMER PROCESSES Masuhiro Kogoma -- 8.1. Introduction -- 8.2. Experimental -- 8.3. Results and Discussion -- 8.3.1. FTIR and Emission Spectra -- 8.3.2. Mass Spectrometry of C2H4 and C2F4 in He APG Discharge -- 8.3.3. TEOS deposition by APG Plasma -- References -- CHAPTER 9 HARD PLASMA POLYMERS, COMPOSITES AND PLASMA POLYMER FILMS PREPARED BY RF SPUTTERING OF CONVENTIONAL POLYMERS Hynek Biederman, Pavel Kudrna and Danka Slavinska -- 9.1. Introduction -- 9.2. Hard Plasma Polymer and Hard Carbon Films -- 9.3. Composite Metal/plasma Polymer Films -- 9.3.1. Deposition techniques -- 9.3.1.1 Simultaneous Plasma Polymerization and Sputter-etching using an rf Discharge -- 9.3.1.2. Simultaneous Plasma Polymerization of an Organic Gas and Evaporation of a Metal -- 9.3.1.3. Plasma Polymerization of Metal Organic Compounds -- 9.3.1.4. Co-sputtering from Composite Metal/Polymer Target.

9.3.1.5. Dc planar Magnetron Sputtering and Simultaneous Plasma Polymerization -- 9.3.2. Structure and Morphology of the Composite Films -- 9.3.3. Deposition Process and Composite Film Growth -- 9.3.4. Basic Physical Properties - Characterization -- 9.3.4.1. Structure, Morphology and Composition -- 9.3.4.2. Optical Properties -- 9.3.4.3. Electrical Properties -- 9.3.4.4. Mechanical Properties -- 9.3.4.5. Aging -- 9.3.5. Complex Composite Films -- 9.4. Plasma Polymer Films Prepared by rf Sputtering -- 9.4.1. Fluorocarbon Plasma Polymers -- 9.4.2. Hydrocarbon Plasma Polymers -- 9.5. Conclusions -- Acknowledgements -- References -- CHAPTER 10 BIOMEDICAL APPLICATIONS OF PLASMA-DEPOSITED THIN FILMS Kathryn J. Kitching, Vicki Pan and Buddy D. Ratner -- 10.1. Introduction -- 10.2. Biocompatibility: Relationship to Plasma Deposited Films -- 10.3. Applications for Cell and Tissue Culture -- 10.4. Applications for Controlled Release -- 10.5. Applications for Biosensors and Electrodes -- 10.6. Applications for Implanted and Blood-Contacting Biomaterials -- 10.7. Applications for Contact Lenses -- 10.8. Non-fouling Coatings -- 10.9. Plasma Surface Treatments For Biorecognition -- 10.10. Patterned Plasma-Deposited Films -- 10.11. Perspectives and Conclusions -- Acknowledgements -- References -- INDEX.