Cover image for Handbook of plasma processing technology fundamentals, etching, deposition, and surface interactions
Handbook of plasma processing technology fundamentals, etching, deposition, and surface interactions
Title:
Handbook of plasma processing technology fundamentals, etching, deposition, and surface interactions
Author:
Rossnagel, Stephen M.
ISBN:
9781591242970

9780815512202
Publication Information:
Park Ridge, N.J. : Noyes Publications, ©1990.
Physical Description:
1 online resource (xxiii, 523 pages) : illustrations.
Series:
Materials science and process technology series

Materials science and process technology series.
Abstract:
An overview of the technology that describes the advantages provided by plasmas, plasma fundamentals, and a range of plasma processes relevant to the deposition and etching of thin films for microelectronics and other fields.
Local Note:
Knovel Library
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