Atomic Layer Deposition : Principles, Characteristics, and Nanotechnology Applicatons.
Title:
Atomic Layer Deposition : Principles, Characteristics, and Nanotechnology Applicatons.
Author:
K??ri?inen, Tommi.
ISBN:
9781118747384
Personal Author:
Edition:
2nd ed.
Physical Description:
1 online resource (229 pages)
Contents:
Cover -- Title Page -- Copyright Page -- Contents -- Acknowledgements -- Foreword -- Preface -- 1 Fundamentals of Atomic Layer Deposition -- 1.1 Chemical Vapour Deposition -- 1.1.1 Thermal CVD -- 1.1.2 Plasma Enhanced CVD (PECVD) -- 1.2 Vapour Adsorption -- 1.2.1 Physisorption -- 1.2.2 Chemisorption -- 1.3 Atomic Layer Deposition (ALD) -- 1.3.1 Thermal ALD Processes -- 1.3.2 Radical Enhanced ALD (REALD) -- 1.3.3 Spatial ALD (SALD) -- References -- 2 Elemental Semiconductor Epitaxial Films -- 2.1 Epitaxial Silicon -- 2.1.1 Dichlorosilane Processes -- 2.1.2 Other Processes -- 2.1.3 Epitaxial Germanium -- References -- 3 III-V Semiconductor Films -- 3.1 Gallium Arsenide -- 3.1.1 Organometallic Precursors -- 3.1.2 Halogen Precursors -- 3.2 Other III-V Semiconductor Films -- 3.3 Applications -- 3.3.1 Photonic Structures -- 3.3.2 Transistors -- References -- 4 Oxide films -- 4.1 Introduction -- 4.2 Aluminum Oxide -- 4.2.1 Processes and Properties of Aluminum Oxide -- 4.3 Titanium Dioxide -- 4.3.1 Processes and Properties of TiO2 -- 4.4 Zinc Oxide -- 4.4.1 Processes and Properties of ZnO -- 4.5 Zirconium Dioxide -- 4.5.1 Processes and Properties of ZrO2 -- 4.6 Hafnium Dioxide -- 4.6.1 Processes and Properties of HfO2 -- 4.7 Other Oxides -- 4.7.1 Tin Oxide -- 4.7.2 Indium Oxide -- 4.7.3 Tantalum Oxide -- 4.8 Mixed Oxides and Nanolaminates -- 4.8.1 Mixed Oxide Processes -- 4.8.2 Nanolaminate Oxides -- 4.9 Multilayers -- References -- 5 Nitrides and Other Compounds -- 5.1 Introduction -- 5.2 Nitrides -- 5.2.1 Transition Metal Nitrides -- 5.2.2 Group III Nitrides -- 5.2.3 Group IV Nitrides -- 5.2.4 Mixed Nitrides -- 5.3 Chalcogenides -- 5.4 Other Compounds -- References -- 6 Metals -- 6.1 Introduction -- 6.2 Noble Metals -- 6.2.1 Silver Processes and Applications -- 6.2.2 Ruthenium Processes and Applications.
6.2.3 Platinum and Palladium Processes and Applications -- 6.2.4 Rhrodium Processes and Applications -- 6.2.5 Iridium Processes and Applications -- 6.3 Titanium -- 6.4 Tantalum -- 6.5 Aluminum -- 6.6 Copper -- 6.7 Other Transition Metals -- References -- 7 Organic and Hybrid Materials -- 7.1 Introduction -- 7.2 Organic layers -- 7.3 Hybrid Organic-inorganic Layers. -- 7.4 Applications of Organic and Hybrid Films -- References -- 8 ALD Applications and Industry -- 8.1 Introduction -- 8.2 MEMS/NEMS -- 8.3 Thin Film Magnetic Heads -- 8.4 Coating Nanoparticles, Nanomaterials and Porous Objects -- 8.5 Optical Coatings -- 8.6 Thin Film Electroluminescent Displays -- 8.7 Solar Cells -- 8.8 Anti-corrosion Layers -- 8.9 Opportunities in Organic Electronics -- 8.10 ALD Tool Manufacturers and Coating Providers -- References -- Index.
Abstract:
Since the first edition was published in 2008, Atomic Layer Deposition (ALD) has emerged as a powerful, and sometimes preferred, deposition technology. The new edition of this groundbreaking monograph is the first text to review the subject of ALD comprehensively from a practical perspective. It covers ALD's application to microelectronics (MEMS) and nanotechnology; many important new and emerging applications; thermal processes for ALD growth of nanometer thick films of semiconductors, oxides, metals and nitrides; and the formation of organic and hybrid materials.
Local Note:
Electronic reproduction. Ann Arbor, Michigan : ProQuest Ebook Central, 2017. Available via World Wide Web. Access may be limited to ProQuest Ebook Central affiliated libraries.
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