Modeling of film deposition for microelectronic applications
Title:
Modeling of film deposition for microelectronic applications
Author:
Rossnagel, Stephen M.
ISBN:
9780125330220
Publication Information:
San Diego : Academic Press, c1996.
Physical Description:
xiv, 291 p. : ill. ; 24 cm.
Series:
Thin films ; v. 22
Series Title:
Thin films ; v. 22
Contents:
M.J. Brett, S.K. Dew, and T.J. Smy, Thin Film Microstructure and Process Simulation Using SIMBAD. S. Hamaguchi, Mathematical Methods for Thin Films Deposition Simulations. C.-C. Fang, V. Prasad, R.V. Joshi, F. Jones, and J.J. Hsieh, A Process Model for Sputter-Deposition of Thin Films Using Molecular Dynamics. T.S. Cale and V. Mahadev, Feature Scale Transport and Reaction during Low Pressure. Chapter References. Author Index. Subject Index.
Thin film microstructure and process simulation using SIMBAD / Mathematical methods for thin film deposition simulations / A process model for sputter deposition of thin films using molecular dynamics / Feature scale transport and reaction during low-pressure deposition processes
Abstract:
Physics of Thin Films is one of the longest running continuing series in thin film science, consisting of 22 volumes since 1963. The series contains quality studies of the properties of various thin filmsmaterials and systems. In order to be able to reflect the development of today's science and to cover all modern aspects of thin films, the series, starting with Volume 20, has moved beyond the basic physics of thin films. It now addresses the most important aspects of both inorganic and organic thin films, in both their theoretical as well as technological aspects. Therefore, in order to reflect the modern technology-oriented problems, the title has been slightly modified from Physics of Thin Films to Thin Films.
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