Recent Advances in Thin-film Deposition -- Molecular-beam Deposition of High-k Gate Dielectrics for Advanced CMOS -- LEPECVD — A Production Technique for SiGe MOSFETs and MODFETs -- Thin-film Engineering by Atomic-layer Deposition for Ultra-scaled and Novel Devices -- Atomic-layer Deposited Barrier and Seed Layers for Interconnects -- Copper CVD for Conformal Ultrathin-film Deposition -- Pushing PVD to the Limits — Recent Advances -- Surface Engineering Using Self-assembled Monolayers: Model Substrates for Atomic-layer Deposition -- Selective Airgaps: Towards a Scalable Low-k Solution -- Silicides — Recent Advances and Prospects -- TEM Characterization of Strained Silicon -- Material Aspects of Non-Volatile Memories -- An Introduction to Nonvolatile Memory Technology -- Floating-dot Memory Transistors on SOI Substrate -- Ion-beam Synthesis of Nanocrystals for Multidot Memory Structures -- Scaling of Ferroelectric-based Memory Concepts -- Device Concepts with Magnetic Tunnel Junctions -- Phase-change Memories -- Amorphous-to-fcc Transition in GeSbTe Alloys -- Organic Nonvolatile Memories -- Materials for Interconnects -- Interconnect Technology — Today, Recent Advances and a Look into the Future -- Dielectric and Scaling Effects on Electromigration for Cu Interconnects -- Texture and Stress Study of Sub-Micron Copper Interconnect Lines Using X-ray Microdiffraction -- Stress Modeling for Copper Interconnect Structures -- Conductivity Enhancement in Metallization Structures of Regular Grains -- Advanced Barriers for Copper Interconnects -- Synthesis and Characterization of Compounds Obtained by Crosslinking of Polymethylhydrosiloxane by Aromatic Rings -- Revealing the Porous Structure of Low-k Materials Through Solvent Diffusion -- Carbon Nanotube Via Technologies for Future LSI Interconnects -- Nickel Nanowires Obtained by Template Synthesis -- Materials for Assembly/Packaging -- The Importance of Polymers in Wafer-Level Packaging -- Electrically Conductive Adhesives as Solder Alternative: A Feasible Challenge -- The Role of Au/Sn Solder in Packaging -- Packaging Materials: Organic-Inorganic Hybrids for Millimetre-Wave Optoelectronics -- Wafer-Level Three-Dimensional Hyper-Integration Technology Using Dielectric Adhesive Wafer Bonding -- Advanced Materials Characterization -- Challenges to Advanced Materials Characterization for ULSI Applications -- Advanced Material Characterization by TOFSIMS in Microelectronic -- Electronic Properties of the Interface Formed by Pr2O3 Growth on Si(001), Si(111) and SiC(0001) Surfaces -- Materials Characterization by Ellipsometry -- Thermal Desorption Spectrometry as a Method of Analysis for Advanced Interconnect Materials -- Electron Backscatter Diffraction: Application to Cu Interconnects in Top-View and Cross Section -- X-ray Reflectivity Characterisation of Thin-Film and Multilayer Structures.