Cover image for Nanolithography and patterning techniques in microelectronics
Nanolithography and patterning techniques in microelectronics
Title:
Nanolithography and patterning techniques in microelectronics
Author:
Bucknall, David G.
ISBN:
9781615831869

9781855739314

9781845690908
Publication Information:
Cambridge : Woodhead Pub. ; Boca Raton, FL : CRC Press, c2005.
Physical Description:
1 online resource (xiv, 409 p.) : ill.
Series:
Woodhead Publishing in materials

Woodhead Publishing in materials.
Contents:
Prelium; Contents; Block copolymer nanolithography; Surface-induced structure formation of polymer blends; Rapid prototyping of functional microfabricated devices by soft lithography; Chemomechanical surface modification of materials for patterning; Patterning of polymer thin films; Ion beam patterning; Nanofabrication by shadow deposition through nanostencils; Photolithography beyond the diffraction limit; Ink-jet printing as a tool in manufacturing and instrumentation; Actuators and patterns for microfluidic control; Manipulation of biomolecules and reactions
Abstract:
Currently surface patterning is achieved by means of optical lithographic techniques but with industry moving towards the fabrication of devices with size features of 100 nm less, the technological community is looking for alternative approaches to materials fabrication at the nanoscale. By using nanolithography scientists can drive patterning currents through surfaces while building a 3D structure from a series of patterned layers. Electron induced chemical lithography can create ultra-high resolution templates for the site selective immobilisation of molecules, to form functional, hierarchic.
Added Author:
Holds: Copies: