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1.
Metal Impurities in Silicon- and Germanium-Based Technologies Origin, Characterization, Control, and Device Impact
Metal Impurities in Silicon- and Germanium-Based Technologies Origin, Characterization, Control, and Device Impact
by
Claeys, Cor. author.
https://doi.org/10.1007/978-3-319-93925-4
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Epitaxial Growth of III-Nitride Compounds Computational Approach
Epitaxial Growth of III-Nitride Compounds Computational Approach
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Matsuoka, Takashi. editor.
https://doi.org/10.1007/978-3-319-76641-6
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3.
Oxide Materials at the Two-Dimensional Limit
Oxide Materials at the Two-Dimensional Limit
by
Netzer, Falko P. editor.
https://doi.org/10.1007/978-3-319-28332-6
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