Front Cover -- Title Page -- Copyright Page -- Contents -- Preface -- Part 1: Particle Adhesion: Fundamentals -- 1 Fundamental Forces in Particle Adhesion -- 1.1 Introduction -- 1.2 Various Forces in Particle Adhesion -- 1.2.1 Capillary Forces -- 1.2.2 van der Waals Forces -- 1.2.3 Electrostatic Forces -- 1.3 Summary -- References -- 2 Mechanics of Particle Adhesion and Removal -- 2.1 Introduction -- 2.2 Models -- 2.2.1 Particle Adhesion and Detachment Models -- 2.2.2 Rough Particles Adhesion -- 2.2.3 Charge Distribution -- 2.2.4 Electrostatic Forces -- 2.2.5 Capillary Force -- 2.2.6 Hydrodynamic Forces and Torque -- 2.2.7 Particle Detachment Models -- 2.3 Simulations Results -- 2.4 Summary and Conclusions -- Acknowledgements -- References -- 3 Microscopic Particle Contact Adhesion Models and Macroscopic Behavior of Surface Modified Particles -- 3.1 Introduction -- 3.2 Constitutive Contact Models -- 3.2.1 Elastic Contact Deformation -- 3.2.2 Elastic-plastic Contact Deformation -- 3.2.3 Plastic Contact Deformation -- 3.2.4 Unloading -- 3.3 Macroscopic Powder Behavior - Continuum Mechanics Approach -- 3.4 Surface Modification to Alter the Adhesion Properties -- 3.4.1 Surface Free Energy: Dispersion and Polar Components -- 3.4.2 Glass Surface Cleaning Prior to Silanization -- 3.4.3 Silanization -- 3.5 Experimental Measurements of the Adhesion Forces -- 3.5.1 Single Particle Adhesion Measurements -- 3.5.2 Shear Testing - Macromechanical Approach -- 3.6 Summary and Conclusions -- Acknowledgements -- List of Symbols -- References -- 4 Characterization of Single Particle Adhesion: A Review of Recent Progress -- 4.1 Introduction -- 4.2 Background -- 4.2.1 Adhesion Models -- 4.2.2 Measurement Methods -- 4.2.3 Non-contact Adhesion Characterization of Single Particles -- 4.2.4 Particle Adhesion to Nano-film Coated Surfaces.

4.2.5 Non-contact Particle Manipulation -- 4.2.6 Molecular-scale Characterization Challenges in Biological Adhesion -- 4.3 Recent Developments -- 4.3.1 Nonlinear Dynamics in Adhesion Characterization of Micro-Particles -- 4.3.2 Adhesion Characterization of Monolayer Graphene by Vibrational Spectroscopy -- 4.3.3 Controllable Rolling Motion of Micro-Spherical Particles in SAW Fields -- 4.4 Conclusions and Remarks -- Acknowledgments -- List of Symbols -- References -- Part 2: Particle Removal Techniques -- 5 High Intensity Ultrasonic Cleaning for Particle Removal -- 5.1 Introduction -- 5.2 Ultrasound and Ultrasonics -- 5.2.1 Ultrasound Waves -- 5.2.2 Factors Hindering the Transmission of Ultrasound Waves -- 5.2.3 Principal Mechanism of High Power Ultrasound -- 5.3 Cavitation Phenomenon -- 5.3.1 Cavitations and Micro-streaming -- 5.3.2 Frequency and Cavitation Abundance -- 5.3.3 Types of Cavitations -- 5.4 Generation of Ultrasound - Transducers -- 5.4.1 Gas-driven Transducers -- 5.4.2 Liquid-driven Transducers -- 5.4.3 Electromechanical Transducers -- 5.4.4 Transducer Assembly -- 5.4.5 Ultrasonic Immersible Transducers -- 5.5 Ultrasonic Generators -- 5.5.1 Power Requirements -- 5.5.2 Multi-Frequency Ultrasonic Systems -- 5.6 Principles of Ultrasonic Cleaning for Particle Removal -- 5.6.1 Cleaning Process Parameters -- 5.7 Determination of Residual Particles on Surfaces -- 5.8 Ultrasonic Aqueous Cleaning Equipment and Process -- 5.9 Precision Cleaning -- 5.10 Contaminants -- 5.11 Ultrasonic Cavitation Forces and Surface Cleaning -- 5.11.1 Requirements to Produce Cavitations -- 5.12 Cleaning Chemistry -- 5.12.1 Selection of Ultrasonic Cleaning Chemicals -- 5.12.2 Maximizing the Overall Cleaning Effect -- 5.13 Mechanism of Cleaning -- 5.13.1 Particle Removal -- 5.13.2 Particle Removal Mechanism -- 5.13.3 Prevention of Particle Re-deposition.

5.13.4 Cleaning Chemistry and Particle Removal -- 5.14 Cavitation Erosion -- 5.15 Summary -- References -- 6 Megasonic Cleaning for Particle Removal -- 6.1 Introduction -- 6.1.1 Wafer Cleaning -- 6.2 Principles of Megasonic Cleaning -- 6.2.1 Acoustic Streaming -- 6.2.2 Acoustic Cavitation -- 6.3 Particle Removal Mechanisms During Megasonic Cleaning -- 6.4 Types of Megasonic Systems -- 6.5 Particle Removal and Feature Damage in Megasonic Cleaning -- 6.6 Summary -- References -- 7 High Speed Air Jet Removal of Particles from Solid Surfaces -- 7.1 Introduction -- 7.2 Fundamental Characteristics of the Air Jet -- 7.3 Fundamentals of Air Jet Particle Removal -- 7.3.1 Definition of Parameters and Removal Efficiency -- 7.3.2 Effect of Pressure Drop ΔPn and Distance d on Removal Efficiency η [22] -- 7.3.3 Effect of Impinging Angle θ [21, 23] -- 7.3.4 Effect of Scan Speed of Air Jet -- 7.3.5 Other Parameters Affecting the Removal Efficiency -- 7.4 New Methods Using Air Jet -- 7.4.1 Pulsed-jet Method -- 7.4.2 Vibrating Air Jet Method -- 7.5 Summary and Prospect -- List of Symbols -- References -- 8 Droplet Spray Technique for Particle Removal -- 8.1 Introduction -- 8.2 Droplet Impact Phenomena -- 8.2.1 Impact on Solid Surface -- 8.2.2 Crown Formation -- 8.2.3 Impact on Liquid Film -- 8.3 Cleaning Process Window -- 8.3.1 Theoretical Studies -- 8.3.2 Experimental Studies -- 8.4 Droplet Spray Technique for Semiconductor Wafer Cleaning -- 8.4.1 Initial Studies -- 8.4.2 Droplet Distribution Optimization -- 8.4.3 Advanced Spray -- 8.5 Summary -- References -- 9 Laser-Induced High-Pressure Micro-Spray Process for Nanoscale Particle Removal -- 9.1 Introduction -- 9.1.1 Nanoscale Contamination Control -- 9.1.2 Review of Physical Cleaning Methods -- 9.2 Concept of Droplet Opto-Hydrodynamic Cleaning (DOC) -- 9.3 Micro-Spray Generation by LIB.

9.4 Mechanisms of Particle Removal by Laser-Induced Spray Jet -- 9.5 Generation of Micro-Spray Jet -- 9.5.1 Experimental Setup -- 9.5.2 Hydrodynamic Phenomena -- 9.6 Nanoscale Particle Removal -- 9.6.1 Experimental Setup -- 9.6.2 Optimization of Micro-Spray Jet -- 9.6.3 Effect of Process Parameters -- 9.6.4 Sub-100 nm Particle Cleaning -- 9.7 Summary -- References -- 10 Wiper-Based Cleaning of Particles from Surfaces -- 10.1 Introduction -- 10.1.1 Why Wipe? -- 10.1.2 Particle Cleanliness -- 10.2 Basic Mechanism of Wiping for Cleaning of Particles and Other Contaminants -- 10.2.1 Why Wiping Works -- 10.2.2 Wiping Mechanisms for Particle Removal -- 10.2.3 Contamination Types -- 10.3 Various Types of Wipers -- 10.3.1 Fabric Construction -- 10.3.2 Edge Type -- 10.3.3 Selecting a Cleanroom Wiper -- 10.4 Proper Ways to Carry Out Wiping or How to Use Wipers Properly -- 10.4.1 The Purpose of Wiping -- 10.4.2 Wiping Methods -- 10.4.3 Introductory Training Example for Wiper-Based Particle Cleaning -- 10.5 Characterization of Wipers -- 10.5.1 Methods to Assess Wiper Particle and Fiber Contamination Levels -- 10.6 Results Obtained Using Wiping -- 10.6.1 Test Method -- 10.6.2 Experimental Setup -- 10.6.3 Data Collection -- 10.6.4 Results -- 10.6.5 Comments -- 10.7 Future Directions -- 10.7.1 Nanotechnology -- 10.7.2 Microfiber Technology -- 10.8 Summary -- References -- 11 Application of Strippable Coatings for Removal of Particulate Contaminants -- 11.1 Introduction -- 11.2 Coating Description -- 11.2.1 Coating Properties -- 11.3 Types of Strippable Coatings -- 11.3.1 Solvent-Based Coatings -- 11.3.2 Water-Based Coatings -- 11.3.3 Coatings for Removal of Radioactive Contamination -- 11.3.4 Hazardous Materials Cleaning -- 11.3.5 UV Curable Coatings -- 11.4 Issues with Strippable Coatings -- 11.5 Precision Cleaning Applications -- 11.5.1 Optical Surfaces.

11.5.2 Other Applications -- 11.5.3 Non-Optical Cleaning Applications -- 11.6 Summary -- Disclaimer -- References -- 12 Cryoaerosol Cleaning of Particles from Surfaces -- 12.1 Introduction -- 12.2 History of Cryoaerosol Cleaning -- 12.3 Thermodynamics of Cryoaerosol Processes -- 12.3.1 Thermodynamics of CO2 Aerosol Process -- 12.3.2 Thermodynamics of Ar/N2 Cryogenic Aerosol System -- 12.4 Cleaning Mechanism -- 12.5 Factors Affecting Cleaning Performance -- 12.5.1 Moisture Control -- 12.5.2 Control of Electrostatic Charging -- 12.5.3 Airflow Management -- 12.5.4 Aerosol Particle Size Control -- 12.5.5 Gas Purity -- 12.6 Results Obtained by Cryoaerosol Cleaning -- 12.7 Summary and Prospects -- References -- 13 Supercritical Carbon Dioxide Cleaning: Relevance to Particle Removal -- 13.1 Introduction -- 13.2 Surface Cleanliness Levels -- 13.3 Dense Phase Fluids -- 13.3.1 Supercritical Carbon Dioxide -- 13.4 Principles of Supercritical CO2 Cleaning -- 13.4.1 Cleaning Systems -- 13.4.2 Costs -- 13.5 Advantages and Disadvantages of Supercritical CO2 Cleaning -- 13.5.1 Advantages -- 13.5.2 Disadvantages -- 13.6 Applications -- 13.6.1 Cleaning Spacecraft Components and Planetary Protection -- 13.6.2 Cleaning of Printing Rollers -- 13.6.3 Carbon Nanotubes -- 13.6.4 Soil Cleaning with Ionic Liquids and SCCO2 -- 13.6.5 Conservation of Historical Art Objects and Structures -- 13.6.6 Sterilization -- 13.6.7 Monitoring of SCCO2 Precision Cleaning Processes with the Quartz Crystal Microbalance -- 13.7 Summary and Conclusions -- Acknowledgement -- Disclaimer -- References -- 14 The Use of Surfactants to Enhance Particle Removal from Surfaces -- 14.1 Introduction -- 14.2 Solid-Solid Interactions -- 14.3 Introduction to Surfactants -- 14.4 Surfactant Adsorption at Solid Surfaces -- 14.5 Surfactants and Particulate Removal -- 14.6 Prospects -- 14.7 Summary.

Acknowledgements.