This thesis presents the pioneering methods for the design, fabrication process, and performance evaluation of graphene (G) and n-type silicon (n-Si) based self-powered one dimensional (1D) and two dimensional (2D) photodetector arrays (PDAs) on a silicon on insulator (SOI) substrate. In the device structure, monolayer G is utilized as hole collecting transparent conductive electrode (TCE) and n-Si is used as light absorbing material, respectively. After analyzing the photo-response characteristics of single pixel G/n-Si diode on SOI, we fabricated G/n-Si based Schottky barrier 1D PDAs with common G electrode, separate G electrode and 2D PDA with individual G electrodes on linearly arrayed n-Si channels, respectively. Each G/n-Si diodes exhibited a clear rectifying Schottky character with low dark current and diode parameters were analyzed using the current-voltage measurement. Besides, all diodes demonstrated a clear photovoltaic activity under the light illumination and maximum responsivity at 660 nm peak wavelength. Each diode in PDA revealed similar device performances under self-powered mode in terms of an Ilight/Idark ratio up to 104 , a responsivity of ~0.1 A/W and a response speed of ~1.3 μs at 660 nm wavelength. The optical crosstalk was extremely low between neighboring diodes and also it could be greatly minimized when G is used as separated electrode on arrayed Si up to ~0.10% (-60 dB) per array. Time dependent photocurrent spectroscopy measurements revealed an excellent photocurrent reversibility of both device types. In the diode structure, the homogeneity of the graphene film transferred on n-Si were examined by Raman mapping and correlated with the sensitivity of diode to incoming light. This thesis paves the way for the new generation of optoelectronic devices with various potential by integrating G and SOI technology to PDA devices with ease of fabrication.