by
Kalkan, Sırrı Batuhan, author.
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passivated with thin SiO2 film grown by Thermal Evaporation and Pulsed Electron Deposition (PED) techniques
by
Akça, Fatime Gülşah, author.
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films were determined by scanning electron microscopy (SEM). Electrical properties were measured by van
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by
Tozan, Şerife.
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problem by chaning distance between target and substrate, and laser power. Furthermore Electron Dispersive
by
Ulucan, Savaş.
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were taken.Electron Dispersive X-Ray Spectroscopy (EDX) technique was used to identify the chemical
by
Aksak, Meral.
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studied systematically by utilizing Fe and Co catalyst thin films and with the help of Raman spectroscopy
by
Okur, Serdal.
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characterization of the plasma nitrided layers were investigated by X-ray diffraction (XRD), scanning electron
by
Ekmekçioğlu, Merve, author.
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Alıntı:
spectroscopy (EDS), scanning electron microscopy (SEM), Xray diffraction (XRD) and Raman spectroscopy.
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