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2. 
Reactive ion beam etching and characterization of high-Tc superconductor Bi2212 için kapak resmi
Reactive ion beam etching and characterization of high-Tc superconductor Bi2212
Reactive ion beam etching and characterization of high-Tc superconductor Bi2212
by 
Köseoğlu, Hasan.
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photolithography, magnetron sputtering and reactive ion beam etching techniques, the mesas with size of 40-100x300
4. 
Grawth and electrical characterization of high purity carbon nanotubes için kapak resmi
Grawth and electrical characterization of high purity carbon nanotubes
Grawth and electrical characterization of high purity carbon nanotubes
by 
Kır, Serap.
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deposited on to Si/SiO2/Al2O3 substrates by DC magnetron sputtering. In this study, the effective parameters
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4 sonuç bulundu Arama sonuçlarına abone ol

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