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by
Büyükköse, Serkan.
Format:
El Yazması
Alıntı:
SiOx substrates with DC magnetron sputtering method. Thin films were characterized via x-ray
by
Algül, Berrin Pınar.
Format:
El Yazması
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) thin-films.200 nm thick YBCO thin films were deposited using a dc Inverted Cylindrical Magnetron Sputtering
by
Ulucan, Savaş.
Format:
El Yazması
Alıntı:
. Magnetron sputtering system is a widely used method to deposit thin films. In this study, an MgB2/Mg target
by
Oğuz, Kaan.
Format:
El Yazması
Alıntı:
. The multilayer structures were grown by magnetron sputtering technique and characterized by X-Ray
by
Yurttaş, Betül, author.
Format:
El Yazması
Alıntı:
on ITO thin film substrate by DC magnetron sputtering technique. The properties of the electrodes
by
Alduran, Yeşim, author.
Format:
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sputtering technique. All thin films were grown on SLG different ratios like 1 sec, 3 secs, 5 secs and 7 secs
by
Uyanık, Zemzem, author.
Format:
El Yazması
Alıntı:
investigated as a function of the Ag and ITO film thicknesses. The IAI films have been prepared by dc magnetron
by
Meriç, Ece, author
Format:
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Alıntı:
sulfurization time were investigated. CZTS thin films were fabricated by DC magnetron sputtering method on
by
Demirhan, Yasemin, author.
Format:
El Yazması
Alıntı:
fabrication, Bi2Sr2CaCu2O8+x thin films were deposited by DC and RF magnetron sputtering system on saphirre
by
Kır, Serap.
Format:
El Yazması
Alıntı:
deposited on to Si/SiO2/Al2O3 substrates by DC magnetron sputtering. In this study, the effective parameters
by
Tuna, Öcal.
Format:
El Yazması
Alıntı:
Tin Oxide (ITO) thin films were grown by both DC and RF magnetron sputtering techniques. To know
by
Köseoğlu, Hasan.
Format:
El Yazması
Alıntı:
photolithography, magnetron sputtering and reactive ion beam etching techniques, the mesas with size of 40-100x300
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